MG SERIES: MG 22

MG22 – DOUBLE CHAMBER SERIES

The MG22 single wafer platform offers a flexible system for various wet chemical applications for the wafers front and back side on a low footprint. With plenty of available configuration options the MG22 platform targets process applications with medium throughput requirements.

With its various configuration options, the MG22 platform covers a wide range of process applications and offers the flexibility for customized solutions to target specific application needs.

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MG22 - KEY APPLICATIONS

  • Silicon substrate thinning and stress relief
  • Film removal
  • Metal etch and clean
  • Bevel etch and clean
  • Contamination clean

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